UHV clustertool

UHV hybrid system consisting of

• coating chamber for pulsed laser deposition processes (PLD)
• chamber for magnetron sputter deposition (MSD)
• central handling system
• sample load lock
• sample magazine
  

Technical data

General information

• vacuum: p < 2·10^-8 mbar
• substrate: Ø = 150 mm, m = 5 kg
• targets: 4 in each chamber
• run-to-run reproducibility of the layer thickness: 99.8 %

PLD

• ablation laser: q-switched Nd:YAG with the wavelength λ = 1064 nm, 532 nm, 355 nm and pulse length τ = 4 ... 10 ns

MSD

• sputtering modi: DC and RF
• typical working pressure: p_{A r} ≥ 7 ·10^-4 mbar
• target-substrate distance: 50 ... 100 mm

Typical layer characteristics

• layer thickness: 0,2 ... 500 nm
• very low roughness in the range of 0.15 ... 0.3 nm
• uniformity: 99.5 - 99.9 % more than 150 mm

Some results

• MSD: Mo/Si multilayers with X-ray reflections of 70 % (wavelength λ = 13.5 nm, incidence angle α = 1,5 °)
• PLD: Ni/C multilayers with d_P = 3.25 nm and R_Cu-Kα = 73 %