Fraunhofer Institute for Material and Beam Technology IWS
Vacuum arc evaporator in reactive mode.
The Physical vapor deposition processes (PVD) allow the deposition of high-quality tribological and functional layers in the thickness range from a few nanometers to several tens of micrometers. For this purpose, processes ranging from high-rate vapor deposition to highly activated plasma processes as well as their combinations are available at the Fraunhofer IWS. A particular focus is on the extensive use of arc discharges as the most effective source of high-energy steam jets.
Our Range of Services Includes:
- Application-specific layers and processes
- Simulation of arc coating processes
- Key components for coating systems
- Consulting