Within the joint project “EUV-projection optics for 14 nanometer resolution (ETIK)“, funded by the Federal Ministry of Education and Research, Fraunhofer IWS scientists achieved substantial progress in the research of reflection layers for extreme ultraviolet radiation. The extraordinary result is the new world record for the reflectance value and directly implies the increased productivity of EUV lithography systems. In addition, further layer properties could be significantly improved, so that they now enable the application of EUV mirrors for higher numerical aperture at simultaneously lower scattered radiation.
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